Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers

Author:

Telling N. D.,Faunce C. A.,Bonder M. J.,Grundy P. J.,Lord D. G.,Van den Berg J. A.,Langridge S.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Nanoadhesion layer for enhanced Si–Si and Si–SiN wafer bonding;Microelectronics Reliability;2012-02

2. Room-temperature Si-SiN wafer bonding by nano-adhesion layer method;2010 Proceedings 60th Electronic Components and Technology Conference (ECTC);2010

3. Structural and transport properties of ferromagnetically coupled Fe/Si/Fe trilayers;Journal of Applied Physics;2008-09-15

4. Structural asymmetry of Si/Fe and Fe/Si interface in Fe/Si multilayers;Journal of Physics D: Applied Physics;2008-05-08

5. Structural and electrical properties of swift heavy ion beam irradiated Fe/Si interface;Bulletin of Materials Science;2007-04

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