A new highly automated sputter equipment for in situ investigation of deposition processes with synchrotron radiation-Reference-Cited by-同舟云学术

A new highly automated sputter equipment for in situ investigation of deposition processes with synchrotron radiation

Published:2013-04 Issue:4 Volume:84 Page:043901
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Döhrmann Ralph¹,Botta Stephan¹,Buffet Adeline¹,Santoro Gonzalo¹,Schlage Kai¹,Schwartzkopf Matthias¹,Bommel Sebastian¹²,Risch Johannes F. H.¹,Mannweiler Roman¹,Brunner Simon³,Metwalli Ezzeldin³,Müller-Buschbaum Peter³,Roth Stephan V.¹

Affiliation:

1. DESY, Deutsches Elektronen-Synchrotron, Notkestrasse 85, D-22607 Hamburg, Germany

2. Institut für Physik, Humboldt-Universität zu Berlin, Newtonstr. 15, D-12489 Berlin, Germany

3. Lehrstuhl für Funktionelle Materialien, Physik-Department, Technische Universität München, James-Franck-Str. 1, D-85748 Garching, Germany

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4798544

Reference35 articles.

1. Stripe-Like Pattern Formation in Airbrush-Spray Deposition of Colloidal Polymer Film

2. Pattern formation of colloidal suspensions by dip-coating: An in situ grazing incidence X-ray scattering study

3. Recent progress in thin film processing by magnetron sputtering with plasma diagnostics

4. Potenzen des Puls-Magnetron-Sputterns (PMS)

5. Modular deposition chamber forin situX-ray experiments during RF and DC magnetron sputtering

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