Phonon diffraction and interference using nanometric features

Author:

Desmarchelier Paul12ORCID,Nikidis Efstratios3ORCID,Anufriev Roman1ORCID,Tanguy Anne45ORCID,Nakamura Yoshiaki6ORCID,Kioseoglou Joseph3ORCID,Termentzidis Konstantinos1ORCID

Affiliation:

1. Univ Lyon, INSA Lyon, CNRS,CETHIL, UMR5008 1 , 69621 Villeurbanne, France

2. Department of Materials Science and Engineering, Johns Hopkins University 2 , Baltimore, Maryland 21218, USA

3. Department of Physics, Aristotle University of Thessaloniki 3 , GR-54124 Thessaloniki, Greece

4. ONERA, University Paris-Saclay, Chemin de la Hunière 4 , BP 80100, 92123 Palaiseau, France

5. Univ Lyon, INSA Lyon, CNRS, LaMCoS, UMR5259 5 , 69621 Villeurbanne, France

6. Graduate School of Engineering and Science, Osaka University 6 , Toyonaka, Japan

Abstract

Phonon diffraction and interference patterns are observed at the atomic scale, using molecular dynamics simulations in systems containing crystalline silicon and nanometric obstacles, such as voids or amorphous inclusions. The diffraction patterns due to these nano-architectured systems of the same scale as the phonon wavelengths are similar to the ones predicted by the simple Fresnel–Kirchhoff integral. The few differences between the two approaches are attributed to the nature of the interface and the anisotropy of crystalline silicon. Based on the wave description of phonons, these findings can provide insights into the interaction of phonons with nano-objects and can have applications in smart thermal energy management.

Funder

IDRIS

GRNET-ARIS

NSF USA

Gordon and Betty Moore Foundation

Publisher

AIP Publishing

Reference35 articles.

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