Investigation of plasmon relaxation mechanisms using nonadiabatic molecular dynamics

Author:

Wu Xiaoyan1ORCID,Liu Baopi1,Frauenheim Thomas123,Tretiak Sergei45ORCID,Yam ChiYung67ORCID,Zhang Yu4ORCID

Affiliation:

1. Shenzhen JL Computational Science and Applied Research Institute, Longhua District, Shenzhen 518110, China

2. Beijing Computational Science Research Center, Haidian District, Beijing 100193, China

3. Bremen Center for Computational Materials Science, University of Bremen, Am Fallturm 1, 28359 Bremen, Germany

4. Physics and Chemistry of Materials, Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA

5. Center of Integrated Nanotechnlogies, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA

6. Shenzhen Institute for Advanced Study, University of Electronic Science and Technology of China, Shenzhen 518000, China

7. Hong Kong Quantum AI Lab Limited, Hong Kong, China

Abstract

Hot carriers generated from the decay of plasmon excitation can be harvested to drive a wide range of physical or chemical processes. However, their generation efficiency is limited by the concomitant phonon-induced relaxation processes by which the energy in excited carriers is transformed into heat. However, simulations of dynamics of nanoscale clusters are challenging due to the computational complexity involved. Here, we adopt our newly developed Trajectory Surface Hopping (TSH) nonadiabatic molecular dynamics algorithm to simulate plasmon relaxation in Au20 clusters, taking the atomistic details into account. The electronic properties are treated within the Linear Response Time-Dependent Tight-binding Density Functional Theory (LR-TDDFTB) framework. The relaxation of plasmon due to coupling to phonon modes in Au20 beyond the Born–Oppenheimer approximation is described by the TSH algorithm. The numerically efficient LR-TDDFTB method allows us to address a dense manifold of excited states to ensure the inclusion of plasmon excitation. Starting from the photoexcited plasmon states in Au20 cluster, we find that the time constant for relaxation from plasmon excited states to the lowest excited states is about 2.7 ps, mainly resulting from a stepwise decay process caused by low-frequency phonons of the Au20 cluster. Furthermore, our simulations show that the lifetime of the phonon-induced plasmon dephasing process is ∼10.4 fs and that such a swift process can be attributed to the strong nonadiabatic effect in small clusters. Our simulations demonstrate a detailed description of the dynamic processes in nanoclusters, including plasmon excitation, hot carrier generation from plasmon excitation dephasing, and the subsequent phonon-induced relaxation process.

Funder

Institute for Materials Science, Los Alamos National Laboratory

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

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