Mechanism for anneal‐induced interfacial charging in SiO2 thin films on Si-Reference-Cited by-同舟云学术

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Mechanism for anneal‐induced interfacial charging in SiO2 thin films on Si

Published:1996-05-20 Issue:21 Volume:68 Page:2993-2995
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Warren W. L.,Vanheusden K.,Schwank J. R.,Fleetwood D. M.,Winokur P. S.,Devine R. A. B.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.116674

Reference25 articles.

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