Two‐ and three‐body quenching of XeF* by Ar and Xe
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.89440
Reference14 articles.
1. Stimulated emission at 281.8 nm from XeBr
2. Laser action on the 2Σ+1/2→2Σ+1/2 bands of KrF and XeCl
3. 354-nm laser action on XeF
4. Electron‐beam‐controlled discharge pumping of the KrF laser
5. Attachment‐dominated electron‐beam‐ionized discharges
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1. Ion-ion mutual neutralization of N2+ with F− and other fluorine-containing negative ions;Chemical Physics Letters;1995-05
2. Excimer lasers;Topics in Applied Physics;1992
3. Spin–orbit state selective formation of rare gas chlorides from three‐body ionic‐recombination reactions of Rg+(2P1/2,3/2)+Cl−+He at thermal energy;The Journal of Chemical Physics;1991-03-15
4. Theoretical evaluation of a short‐pulse electron‐beam‐excited XeF(B→X) laser using a low‐pressure, room‐temperature Ar/Xe/F2gas mixture;Journal of Applied Physics;1990-05
5. Comparative study of low‐pressure rare‐gas fluoride/chloride lasers excited by a short‐pulse electron beam;Journal of Applied Physics;1988-08-15
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