Development of a fluorescence based flux sensor for thin film growth and nanoparticle deposition-Reference-Cited by-同舟云学术

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Development of a fluorescence based flux sensor for thin film growth and nanoparticle deposition

Published:2016-07 Issue:7 Volume:87 Page:075112
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Rev. Sci. Instrum.

Author:

De Roo Bert¹,Vervaele Mattias¹^ORCID,Rajala Markku²^ORCID,Miller Toni²,Guillon Herve³^ORCID,Seo Jin Won⁴,Locquet Jean-Pierre¹

Affiliation:

1. Department of Physics and Astronomy, KU Leuven, Celestijnenlaan 200D, BE-3001 Leuven, Belgium

2. DCA Instruments, 20360 Turku, Finland

3. Kemstream, 34055 Montpellier, France

4. Department of Materials Engineering, KU Leuven, Kasteelpark Arenberg 44 bus 2450, BE-3001 Leuven, Belgium

Funder

Agentschap voor Innovatie door Wetenschap en Technologie (IWT)

Seventh Framework Programme (FP7)

Publisher

AIP Publishing

Subject

Instrumentation

Reference11 articles.

1. Techniques for combinatorial molecular beam epitaxy

2. Effect of growth conditions on stoichiometry in MBE-grown GaAs

3. Self-corrected sensors based on atomic absorption spectroscopy for atom flux measurements in molecular beam epitaxy

4. Real‐time control of molecular beam epitaxy by optical‐based flux monitoring

5. Accurate multiple‐quantum‐well growth using real‐time optical flux monitoring

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Direct Liquid Injection − Low Pressure Chemical Vapor Deposition of Silica Thin Films from Di-t-butoxydiacetoxysilane;Advanced Engineering Materials;2017-07-17

2. A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films;Advanced Engineering Materials;2017-05-12

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