Subnitride and valence band offset at Si3N4∕Si interface formed using nitrogen-hydrogen radicals-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Subnitride and valence band offset at Si3N4∕Si interface formed using nitrogen-hydrogen radicals

Published:2007-03-19 Issue:12 Volume:90 Page:123114
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Higuchi Masaaki,Sugawa Shigetoshi,Ikenaga Eiji,Ushio Jiro,Nohira Hiroshi,Maruizumi Takuya,Teramoto Akinobu,Ohmi Tadahiro,Hattori Takeo

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2715037

Reference20 articles.

1. High-κ gate dielectrics: Current status and materials properties considerations

2. Highly robust ultrathin silicon nitride films grown at low-temperature by microwave-excitation high-density plasma for giga scale integration

3. Nitridation of Silicon and Oxidized‐Silicon

4. Study of atomic transport mechanisms during thermal nitridation of silicon in ammonia using 15N and D labelled gas

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of post‐deposition annealing on chemical composition of SiN _x film in SiO ₂ /SiN _x /SiO ₂ /Si stacked structure;Surface and Interface Analysis;2022-02-21

2. Improving the efficiency of G0W0 calculations with approximate spectral decompositions of dielectric matrices;The Journal of Chemical Physics;2019-12-14

3. Approaching Defect-free Amorphous Silicon Nitride by Plasma-assisted Atomic Beam Deposition for High Performance Gate Dielectric;Scientific Reports;2016-06-21

4. Structural analysis of the interface of silicon nanocrystals embedded in a Si3N4matrix;Journal of Physics D: Applied Physics;2014-05-30

5. β-Si3N4(0001)/Si(111) interface: Phosphorus defects, valence band offsets, and their role of passivating the interface states;Physical Review B;2013-10-18

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3