Relaxation and crystallization kinetics of amorphous germanium films by nanosecond laser pulses
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.356663
Reference25 articles.
1. Calorimetric studies of crystallization and relaxation of amorphous Si and Ge prepared by ion implantation
2. Pulsed laser heating measurement of relaxation‐induced melting point increase in amorphous Si
3. Variable strain energy in amorphous silicon
4. Melting temperature of unrelaxed amorphous silicon
5. Crystallization‐induced stress in silicon thin films
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