Temperature dependence of the surface roughness evolution during hydrogenated amorphous silicon film growth
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1543237
Reference19 articles.
1. In situ ellipsometry of thin-film deposition: Implications for amorphous and microcrystalline Si growth
2. Surface roughening during plasma-enhanced chemical-vapor deposition of hydrogenated amorphous silicon on crystal silicon substrates
3. Growth mechanism of hydrogenated amorphous silicon studied by in situ scanning tunneling microscopy
4. STM Observation on the Initial growth of Amorphous and Microcrystalline Silicon Films
5. Morphological study of kinetic roughening on amorphous and microcrystalline silicon surface
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