Linear growth kinetics of nanometric silicides in Co/amorphous-Si and Co/CoSi/amorphous-Si thin films-Reference-Cited by-同舟云学术

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Linear growth kinetics of nanometric silicides in Co/amorphous-Si and Co/CoSi/amorphous-Si thin films

Published:2008-07-15 Issue:2 Volume:104 Page:024311
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Cserháti C.,Balogh Z.,Csik A.,Langer G. A.,Erdélyi Z.,Glodán Gy.,Katona G. L.,Beke D. L.,Zizak I.,Darowski N.,Dudzik E.,Feyerherm R.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2957071

Reference27 articles.

1. Kinetics of formation of silicides: A review

2. P. Gas and F. d’Heurle, Landolt-Börstein-New Series, Vol. III 33A (Springer, Berlin, 1988), p. 4–1.

3. Initial Stage of Reactive Diffusion: Nucleation and Avrami Kinetics

4. Layer-by-layer versus surfactant dissolution modes in heteroepitaxy

5. Investigation of the interplay of nickel dissolution and copper segregation in Ni/Cu() system

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