Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition

Author:

Hadimani Ravi L.1,Silva Joao H. B.2,Pereira Andre M.3,Schlagel Devo L.4,Lograsso Thomas A.5ORCID,Ren Yang6,Zhang Xiaoyi6,Jiles David C.1,Araújo Joao P.2

Affiliation:

1. Department of Electrical and Computer Engineering, Iowa State University, Ames, Iowa 50011, USA and Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA

2. IFIMUP and IN-Institute of Nanoscience and Nanotechnology, Departamento de Física e Astronomia, da Faculdade de Ciências, da Universidade do Porto, Rua do Campo Alegre, 687, 4169-007 Porto, Portugal

3. Blackett Laboratory, Imperial College, London SW7 2AZ, United Kingdom

4. Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA

5. Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA, Division of Materials Science and Engineering, Ames Laboratory, Ames, Iowa 50011, USA

6. X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA

Funder

Fundacao Ciencia Tecnologia

U.S. Department of Energy (DOE)

Engineering and Physical Sciences Research Council (EPSRC)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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