On a Mott formalism for modeling oxide thin-film transistors

Author:

Yi Guangzheng1ORCID,Li Yuan1ORCID,Cai Kunlin1ORCID,Yu Jun1ORCID,Nathan Arokia12ORCID

Affiliation:

1. School of Information Science and Engineering, Shandong University 1 , Qingdao 266237, China

2. Darwin College, University of Cambridge 2 , Cambridge CB3 9EU, United Kingdom

Abstract

We report on a device model for thin-film transistors (TFTs) in the framework of Mott's trap-and-release transport theory for disordered semiconductors. The model features a so-called Mott function that is demonstrated to be powerful for analytically deriving the terminal characteristics and other critical parameters of TFTs, including threshold voltage, subthreshold swing, and field-effect mobility. The model is validated by way of application to an amorphous InGaZnO (IGZO)-based TFT, for which good agreement between the analytical and experimental data are obtained. This study offers a simple yet powerful formalism for effective parameter characterization and extraction for oxide and other related TFTs, including those from the organic materials family.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Natural Science Foundation of Shandong Province

The Major Scientific and Technological Innovation Project in Shandong Province

Publisher

AIP Publishing

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