Excitation mechanism and thermal emission quenching of Tb ions in silicon rich silicon oxide thin films grown by plasma-enhanced chemical vapour deposition—Do we need silicon nanoclusters?-Reference-Cited by-同舟云学术

Excitation mechanism and thermal emission quenching of Tb ions in silicon rich silicon oxide thin films grown by plasma-enhanced chemical vapour deposition—Do we need silicon nanoclusters?

Published:2014-04-14 Issue:14 Volume:115 Page:143510
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Podhorodecki A.,Golacki L. W.,Zatryb G.,Misiewicz J.,Wang J.,Jadwisienczak W.,Fedus K.,Wojcik J.,Wilson P. R. J.,Mascher P.

Funder

NSF

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4871015

Reference44 articles.

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4. Quantum confinement and recombination dynamics in silicon nanocrystals embedded in Si/SiO2 superlattices

5. Size dependence of lifetime and absorption cross section of Si nanocrystals embedded in SiO2

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