Observation of Si cluster formation in SiO2 films through annealing process using x-ray photoelectron spectroscopy and infrared techniques
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.120865
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4. In situ FT-IR reflective absorption spectroscopy for characterization of SiO2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma
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