Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2940598
Reference23 articles.
1. Proceedings of the IEEE 2003 International Electron Devices Meeting;Prechtl G.,2003
2. Ozone-Based Atomic Layer Deposition of Alumina from TMA: Growth, Morphology, and Reaction Mechanism
3. In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
4. The reaction pathway for the growth of alumina on high surface area alumina and in ultrahigh vacuum by a reaction between trimethyl aluminum and water
5. Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence
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