Solid solubility of As in CoSi2 and redistribution at the CoSi2/Si interface
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.371459
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3. Measurement of the redistribution of arsenic at nickel silicide/silicon interface by secondary ion mass spectrometry: artifact and optimized analysis conditions;Journal of Applied Physics;2008-07-15
4. Redistribution of arsenic during the reaction of nickel thin films with silicon at relatively high temperature: Role of agglomeration;Microelectronic Engineering;2006-11
5. Metal Silicides in CMOS Technology: Past, Present, and Future Trends;Critical Reviews in Solid State and Materials Sciences;2003-11
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