High rate deposition of thick epitaxial films by thermal plasma flash evaporation

Author:

Terashima K.,Yamaguchi Norio,Hattori Tomoyuki,Takamura Y.,Yoshida T.

Publisher

Walter de Gruyter GmbH

Subject

General Chemical Engineering,General Chemistry

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Dependence of the Generation Behavior of Charged Nanoparticles and Ag Film Growth on Sputtering Power during DC Magnetron Sputtering;Electronic Materials Letters;2021-01-13

2. Deposition mechanisms of columnar structured La2Ce2O7 coatings via plasma spray-PVD;Ceramics International;2020-06

3. Conditions for nucleation and growth in the substrate boundary layer at plasma spray-physical vapor deposition (PS-PVD);Surface and Coatings Technology;2019-08

4. Non-Classical Crystallization of Thin Films and Nanostructures in CVD Process;Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices;2016-08-31

5. Other Works Related to Non-classical Crystallization of Thin Films and Nanostructures;Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes;2016

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