Basic phenomena in reactive low pressure plasmas used for deposition and etching-current status
Author:
Publisher
Walter de Gruyter GmbH
Subject
General Chemical Engineering,General Chemistry
Link
https://www.degruyter.com/document/doi/10.1351/pac198456020215/pdf
Reference10 articles.
1. de Rosny;Mosburg;Phys,1983
2. Japan;Hata;Phys,1983
3. Van Sprang and;Verhaart;Chem Phys,1980
4. Solid State;Knights;Rev,1980
5. inski and;Mauer;Sci Technol,1978
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