Nanoparticle Adhesion Models: Applications in Particulate Contaminant Removal from Extreme Ultraviolet Lithography Photomasks-Reference-Cited by-同舟云学术

Nanoparticle Adhesion Models: Applications in Particulate Contaminant Removal from Extreme Ultraviolet Lithography Photomasks

Published:2011-01-01 Issue:8 Volume:25 Page:781-797
ISSN:0169-4243
Container-title:Journal of Adhesion Science and Technology
language:en
Short-container-title:Journal of Adhesion Science and Technology

Author:

Jaiswal Ravi P.¹,Beaudoin Stephen P.²

Affiliation:

1. a School of Chemical Engineering, Purdue University, Forney Hall of Chemical Engineering, 480 Stadium Mall Drive, West Lafayette, IN 47907-2100, USA

2. b School of Chemical Engineering, Purdue University, Forney Hall of Chemical Engineering, 480 Stadium Mall Drive, West Lafayette, IN 47907-2100, USA;, Email: sbeaudoi@purdue.edu

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,General Chemistry

Link

https://www.tandfonline.com/doi/pdf/10.1163/016942410X511123

Reference39 articles.

1. Undercut Removal of Micrometer-Scale Particles from Surfaces

2. Hydrodynamic particle removal from surfaces

3. An Experimental Study of Megasonic Cleaning of Silicon Wafers

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