Chemical composition and properties of films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition
-
Published:2016-05
Issue:3
Volume:50
Page:213-218
-
ISSN:0018-1439
-
Container-title:High Energy Chemistry
-
language:en
-
Short-container-title:High Energy Chem
Author:
Shayapov V. R.,Rumyantsev Yu. M.,Plyusnin P. E.
Publisher
Pleiades Publishing Ltd
Subject
Physical and Theoretical Chemistry
Reference39 articles.
1. Hoffmann, P., Fainer, N., Kosinova, M., Baake, O., and Ensinger, W., Silicon Carbide—Materials, Processing and Applications in Electronic Devices, Mukherjee, M., Ed., Rijeka: InTech, 2011, ch. 21. 2. Wrobel, A.M. and Kryszewski, M., Prog. Colloid Polym. Sci., 1991, vol. 85, p. 91. 3. Hoffmann, P.S., Fainer, N.I., Baake, O., Kosinova, M.L., Rumyantsev, Y.M., Trunova, V.A., Klein, A., Pollakowski, B., Beckhoff, B., and Ensinger, W., Thin Solid Films, 2012, vol. 520, p. 5906. 4. de Carvalho, A.T., Carvalho, R.A.M., Silva, M.L.P., and Demarquette, N.R., Mater. Res., 2006, vol. 9, p. 9. 5. Chang, S.Y., Tsai, H.C., Chang, J.Y., Lin, S.J., and Chang, Y.S., Thin Solid Films, 2008, vol. 516, p. 5334.
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
|
|