Low-power inductive RF plasma sources for technological applications-Reference-Cited by-同舟云学术

Low-power inductive RF plasma sources for technological applications

Published:2004-08 Issue:8 Volume:30 Page:687-697
ISSN:1063-780X
Container-title:Plasma Physics Reports
language:en
Short-container-title:Plasma Phys. Rep.

Author:

Vavilin K. V.,Rukhadze A. A.,Ri M. Kh.,Plaksin V. Yu.

Publisher

Pleiades Publishing Ltd

Subject

Physics and Astronomy (miscellaneous),Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1134/1.1788762.pdf

Reference13 articles.

1. V. P. Silin and A. A. Rukhadze, Electromagnetic Properties of Plasma and Plasma-Like Media (Atomizdat, Moscow, 1961).

2. A. F. Alexandrov, L. S. Bogdankevich, and A. A. Rukhadze, Principles of Plasma Electrodynamics (Vysshaya Shkola, Moscow, 1988; Springer-Verlag, Berlin, 1984).

3. R. W. Boswell, Plasma Phys. Controlled Fusion 26, 1147 (1984).

4. F. F. Chen, Plasma Phys. Controlled Fusion 33, 339 (1991);

5. F. F. Chen and G. Chelavier, J. Vac. Sci. Technol. A 10, 1389 (1992).

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