1. Rudakov, V.I. and Gusev, V.N., Microelektronika, 2008, vol. 37, no. 4, p. 245 [Russian Microelectronics (Engl. Transl.), vol. 37, no. 4, p. 215].
2. Harper, J.M.E., Charai, A., Stolt, L., d’Heurle, F.M., and Fryer, P.M., Appl. Phys. Lett., 1990, vol. 56, no. 25, p. 2519.
3. Olowolafe, J.O., Blanpain Jian Li B., and Mayer, J.W., Appl. Phys. Lett., 1990, vol. 57, no. 13, p. 1307.
4. Chamberlain, M.V., Thin Sol. Films, 1982, vol. 91, p. 155.
5. Murarka, S.P., Silicides for VLSI Aplication New-York-London-Paris: Academic Press, 1983.