1. Mileshko, L.P. and Korolev, A.N., Anodic Oxide Films Formed on Silicon and Silicon Compounds in Doping Electrolytes, Trudy decyatoi mezhdunarodnoi nauchnoi konf. i shkoly-seminara: actual’nye problemy tverdotel’noi electroniki i mikroelectroniki (Proc. Tenth International Scientific Conf. and School-Seminar: The Topical Problems in Solid-State Electronics and Microelectronics), Taganrog: TRTU, 2006, vol. 1, pp. 28–30.
2. Mileshko, L.P., Attainments and Outlook for Doped Oxide Films in the Technology of Semiconductor Devices and ICs, Izv. TRTU, spetsial’nyi vypusk, Trudy XLVIII nauchno-technich. konf. TRTU (Izv. TRTU, Special Issue: Proc. XLVIII Scientific and Technical Conf. of TRTU), Taganrog: TRTU, 2003, no. 1(30), p. 210.
3. Baraban, A.P., Bulavinov, V.V., and Konorov, P.P., Elektronika sloev SiO 2 na kremnii (Electronics in SiO2 Layers on Silicon), Leningrad: LGU, 1988.
4. Chistyakov, Yu.D., Bredikhin, I.S., and Mileshko, L.P., Anodic Silicon Oxide Films as a Solid-State Diffusant in Planar Technology, Zarubezhnaya Elektron. Tekh., Moscow: TsNII Elektronika, 1976, no. 1(134), pp. 3–38.
5. Sorokin, I.N., Sechenov, D.A., Mileshko, L.P., et al., Metodich. ukazan. po izuchen. kursa: “Fiz.-khim. protsessy v tekhnol. radioelektr. apparat. (REA)” po teme electrokhim. protsessy v tekhnol. REA, Chast’ II, Anodnoe okislenie (Methodical Instructions on the Study of Manual on Physicochemical Processes in Technology of Radio-Electronic Instrumentation (REI) on the Subject of Electrochemical Processes in REI Technology: Part II, Anodic Oxidation), Taganrog: TRTI, 1986, 83 p.