1. Fal’kevich, E.S., Pul’ner, E.O., Chervonnyi, I.F., et al., Tekhnologiya poluprovodnikovogo kremniya (Technology of Semiconductor Silicon), Moscow: Metallurgiya, 1992.
2. Ulmer, H.E., Pickens, D., Rahl, F.J., and Lefrancois, P.A., US Patent 4 407 783, 1983.
3. Bulanov, A.D., Moiseev, A.N., Troshin, O.Yu., et al., Fine Purification of Monoisotopic Silanes 28SiH4, 29SiH4, and 30SiH4 via Distillation, Neorg. Mater., 2004, vol. 40, no. 6, pp. 647–649 [Inorg. Mater. (Engl. Transl.), vol. 40, no. 6, pp. 555–557].
4. Devyatykh, G.G., Krylov, V.A., Kovalev, I.D., et al., Impurity Composition of Samples in the Exhibition-Collection of Extrapure Substances: IV. Volatile Inorganic Hydrides, Vysokochist. Veshchestva, 1991, no. 4, pp. 7–13.
5. Devyatykh, G.G. and Zorin, A.D., Letuchie neorganicheskie gidridy osoboi chistoty (Ultrapure Volatile Inorganic Hydrides), Moscow: Nauka, 1974.