Influence of the chemical nature of implanted ions on the structure of a silicon layer damaged by implantation-Reference-Cited by-同舟云学术

Influence of the chemical nature of implanted ions on the structure of a silicon layer damaged by implantation

Author:

Shcherbachev K. D.,Voronova M. I.,Bublik V. T.,Mordkovich V. N.,Pazhin D. M.,Zinenko V. I.,Agafonov Yu. A.

Publisher

Pleiades Publishing Ltd

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

Reference10 articles.

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3. M. Yu. Barabanenkov, A. V. Leonov, V. N. Mordkovich, and N. M. Omel’yanovskaya, Fiz. Tekh. Poluprovodn. 32(5), 523 (1998).

4. F. James, J. P. Ziegler, and M. D. Biersack, Ziegler Stopping and Range of Ions in Matter (SRIM, 2008). 096542071X, 97809654207.

5. K. D. Shcherbachev, A. V. Kuripyatnik, and V. T. Bublik, Zavod. Lab., No. 6, 23 (2003).

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2. Characterization of crystal structure features of a SIMOX substrate;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-12