Author:
Yakovkina L. V.,Smirnova T. P.,Borisov V. O.,Kichai V. N.,Kaichev V. V.
Subject
Materials Chemistry,Metals and Alloys,Inorganic Chemistry,General Chemical Engineering
Reference22 articles.
1. Smirnova, T.P., Kaichev, V.V., Yakovkina, L.V., et al., Composition and Structure of Hafnia Films on Silicon, Inorg. Mater., 2008, vol. 44, no. 9, pp. 965–970.
2. Gritsenko, V.A., Eliseev, A.P., Ivanov, M.V., et al., Synthesis, Structure, and Application of High-Permittivity Insulators in Silicon Devices, Ser. Integrats. Proekty Sib. Otd. Ross. Akad. Nauk, 2011, no. 31.
3. Smirnova, T.P., Lebedev, M.S., Morozova, N.B., et al., MOCVD and Physicochemical Characterization of (HfO2)x(Al2O3)1 − x Thin Films, Chem. Vap. Deposition, 2010, vol. 16, pp. 185–190.
4. Kaichev, B.B., Dubinin, Yu.V., Smirnova, T.P., and Lebedev, M.S., A Study of the Structure of (HfO2)x(Al2O3)1 − x /Si Films by X-Ray Photoelectron Spectroscopy, J. Struct. Chem., 2011, vol. 52, no. 3, pp. 480–487.
5. Adelmann, C., Lehnen, P., Van Elshocht, S., et al., Growth of Dysprosium-, Scandium-, and Hafnium-Based Third Generation High-k Dielectrics by Atomic Vapor Deposition, Chem. Vap. Deposition, 2007, vol. 1, pp. 567–573.
Cited by
13 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献