A pulse-type evaporator for ultrafast deposition of thin films in ultrahigh vacuum-Reference-Cited by-同舟云学术

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A pulse-type evaporator for ultrafast deposition of thin films in ultrahigh vacuum

Published:2007-05 Issue:3 Volume:50 Page:408-410
ISSN:0020-4412
Container-title:Instruments and Experimental Techniques
language:en
Short-container-title:Instrum Exp Tech

Author:

Gouralnik A. S.,Galkin N. G.,Ivanov V. A.,Ivanchenko M. V.,Chusovitin E. A.

Publisher

Pleiades Publishing Ltd

Subject

Instrumentation

Link

http://link.springer.com/content/pdf/10.1134/S0020441207030190.pdf

Reference2 articles.

1. Shen, J., Pierce, J.P., Plummer, E.W., and Kirchener, J., J. Phys.: Condens. Matter, 2003, vol. 15, p. R1.

2. Plusnin, N.I., Il’yashenko, V.M., and Milenin, A.P., PLDS, 2002, vol. 11/12, p. 39.

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3. Effect of deposition rate and a-Si precursor or cap layer on structure and magnetic properties of iron films on silicon substrates;Thin Solid Films;2011-10

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