Structure and properties of films based on HfO2-Sc2O3 double oxide-Reference-Cited by-同舟云学术

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Structure and properties of films based on HfO2-Sc2O3 double oxide

Published:2011-08 Issue:4 Volume:52 Page:743-747
ISSN:0022-4766
Container-title:Journal of Structural Chemistry
language:en
Short-container-title:J Struct Chem

Author:

Yakovkina L. V.,Smirnova T. P.,Borisov V. O.,Jeong-Hwan S.,Morozova N. B.,Kichai V. N.,Smirnov A. V.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Inorganic Chemistry,Physical and Theoretical Chemistry

Link

http://link.springer.com/content/pdf/10.1134/S0022476611040147.pdf

Reference23 articles.

1. H. Ono and T. Katsumata, Appl. Phys. Lett., 78, No. 13, 1832 (2001).

2. J. Kwo, M. Hong, A.R. Kortan, et al., Appl. Phys. Lett., 77, No. 1, 130 (2000).

3. J. Lopez, M.L. Roeckerath, T. Heeg, et al., ECS Trans., 11, No. 4, 311 (2007).

4. P. Myllimaki, M. Roeckerath, and M. Putkonen, Appl. Phys. A, 88, No. 4, 633 (2007).

5. R. Thomas, P. Ehrhart, M. Laysberg, et al., Appl. Phys. Lett., 89, 232902 (2006).

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Phase composition of nanosized oxide film structures based on lanthanum and scandium doped HfO2;Journal of Structural Chemistry;2017-12

2. Growth, chemical composition, and structure of thin La x Hf1 − x O y films on Si;Inorganic Materials;2014-01-29

3. New organometallic precursors and processes for chemical vapor deposition in the technology of nanomaterials;Russian Microelectronics;2013-11-14

4. Synthesis and properties of dielectric (HfO2)1 − x (Sc2O3) x films;Inorganic Materials;2013-01-05

5. Structure of HfO2 films and binary oxides on its base;Journal of Structural Chemistry;2012-07

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