Dynamics of surface roughening of Cl-terminated Si(100)-(2×1) at 700 K
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.67.125320/fulltext
Reference30 articles.
1. A Surface View of Etching
2. Pattern of Si(100): Spontaneous etching withBr2
3. Layer-by-layer etching of Si(100)-2×1 withBr2: A scanning-tunneling-microscopy study
4. Bromine interaction with Si(100)-2×1: Chemisorption and initial stages of etching
5. Temperature-dependent surface morphologies for Br-etched Si(100)-2×1
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1. AlCl3-Dosed Si(100)-2 × 1: Adsorbates, Chlorinated Al Chains, and Incorporated Al;The Journal of Physical Chemistry C;2021-05-19
2. Low temperature Si:C co-flow and hybrid process using Si3H8/Cl2;Thin Solid Films;2012-02
3. Adsorbate-mediated step transformations and terrace rearrangement ofSi(100)−(2×1);Physical Review B;2009-11-24
4. Atomic processes during Cl supersaturation etching ofSi(100)−(2×1);Physical Review B;2009-03-06
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