Electron collisions with boron trichloride(BCl3)molecules
Author:
Publisher
American Physical Society (APS)
Subject
Atomic and Molecular Physics, and Optics
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevA.71.052711/fulltext
Reference43 articles.
1. Reactive ion etching of copper with BCl3 and SiCl4: Plasma diagnostics and patterning
2. Passivation role of sulfur and etching behavior in plasma etched TiW using SF6 and BCl3 gases
3. Dopant incorporation mechanisms during the growth of thin film diamond
4. Conversion of aromatic aldehydes to gem-dichlorides using boron trichloride. A new highly efficient method for preparing dichloroarylmethanes
5. Fundamental Electron Interactions with Plasma Processing Gases
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3. Cross sections and transport properties of positive ions in BF3 plasmas;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-05
4. A theoretical study on a reaction of iron(III) hydroxide with boron trichloride by ab initio calculation;Journal of Molecular Structure: THEOCHEM;2009-12
5. Screening-corrected electron impact total and ionization cross sections for boron trifluoride (BF3) and boron trichloride (BCl3);Journal of Physics B: Atomic, Molecular and Optical Physics;2008-12-01
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