Site-Specific Evolution of Surface Stress during the Room-Temperature Oxidation of theSi(111)−(7×7)Surface
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.104.146101/fulltext
Reference24 articles.
1. Identification of the Initial-Stage Oxidation Products on Si(111)-(7×7)
2. Electronic and vibrational properties of initial-stage oxidation products onSi(111)−(7×7)
3. Reinterpretation of the MolecularO2Chemisorbate in the Initial Oxidation of theSi(111)7×7Surface
4. Observation of two metastable oxygen species adsorbed on aSi(111)−(7×7)surface: Reinterpretation of the initial oxidation process
5. Photoemission study of metastable oxygen adsorbed on aSi(111)−(7×7)surface
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Chemical and kinetic insights into the Thermal Decomposition of an Oxide Layer on Si(111) from Millisecond Photoelectron Spectroscopy;Scientific Reports;2017-10-27
2. Temporally and Spatially Resolved Oxidation of Si(111)-(7 × 7) Using Kinetic Energy Controlled Supersonic Beams in Combination with Scanning Tunneling Microscopy;The Journal of Physical Chemistry C;2016-04-08
3. Attachment–detachment limited kinetics on ultra-flat Si(111) surface under etching with molecular oxygen at elevated temperatures;Surface Science;2015-03
4. Initial and secondary oxidation products on the Si(111)-(7 × 7) surface identified by atomic force microscopy and first principles calculations;Applied Physics Letters;2014-03-31
5. Evolution of surface stress during oxygen exposure of clean Si(111), Si(100), and amorphous Si surfaces;Journal of Applied Physics;2014-01-14
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