Interlayer bond polarizability model for stacking-dependent low-frequency Raman scattering in layered materials-Reference-Cited by-同舟云学术

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Interlayer bond polarizability model for stacking-dependent low-frequency Raman scattering in layered materials

Published:2017 Issue:40 Volume:9 Page:15340-15355
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Liang Liangbo¹²³⁴⁵^ORCID,Puretzky Alexander A.¹²³⁴^ORCID,Sumpter Bobby G.¹²³⁴⁶^ORCID,Meunier Vincent⁵⁷⁸⁹¹⁰^ORCID

Affiliation:

1. Center for Nanophase Materials Sciences

2. Oak Ridge National Laboratory

3. Oak Ridge

4. USA

5. Department of Physics

6. Computational Sciences and Engineering Division

7. Applied Physics

8. and Astronomy

9. Rensselaer Polytechnic Institute

10. Troy

Abstract

A simple model is developed to reveal the stacking dependence of Raman intensities of interlayer vibrations in 2D materials.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2017/NR/C7NR05839J

Reference80 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2. Single-layer MoS2 transistors

3. Progress, Challenges, and Opportunities in Two-Dimensional Materials Beyond Graphene

4. Monolayer behaviour in bulk ReS2 due to electronic and vibrational decoupling

5. Multiwall Nanotubes, Multilayers, and Hybrid Nanostructures: New Frontiers for Technology and Raman Spectroscopy

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