Tuning two-dimensional phase formation through epitaxial strain and growth conditions: silica and silicate on NixPd1−x(111) alloy substrates-Reference-Cited by-同舟云学术

Tuning two-dimensional phase formation through epitaxial strain and growth conditions: silica and silicate on NixPd1−x(111) alloy substrates

Published:2019 Issue:44 Volume:11 Page:21340-21353
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Zhou Chao¹²³⁴^ORCID,Liang Xin⁵²³⁴,Hutchings Gregory S.⁶²³⁴^ORCID,Jhang Jin-Hao⁶²³⁴,Fishman Zachary S.⁶²³⁴^ORCID,Wu Rongting⁵²³⁴⁷^ORCID,Gozar Adrian⁵²³⁴⁷^ORCID,Schwarz Udo D.¹²³⁴⁶^ORCID,Ismail-Beigi Sohrab¹²³⁴⁵^ORCID,Altman Eric I.⁶²³⁴^ORCID

Affiliation:

1. Department of Mechanical Engineering and Materials Science

2. Yale University

3. New Haven

4. USA

5. Department of Applied Physics

6. Department of Chemical and Environmental Engineering

7. Energy Sciences Institute

Abstract

The combined experimental and theoretical results demonstrate the manipulation of 2D VDW silica and 2D Ni silicate through growth conditions, and the determination of the maximum epitaxial strain imparted to the 2D system through alloy substrate.

Funder

National Science Foundation

Brookhaven National Laboratory

U.S. Department of Energy

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2019/NR/C9NR05944J

Reference74 articles.

1. Van der Waals heterostructures