Atomic layer deposition for nanomaterial synthesis and functionalization in energy technology-Reference-Cited by-同舟云学术

Atomic layer deposition for nanomaterial synthesis and functionalization in energy technology

Published:2017 Issue:2 Volume:4 Page:133-154
ISSN:2051-6347
Container-title:Materials Horizons
language:en
Short-container-title:Mater. Horiz.

Author:

Meng Xiangbo¹²³⁴^ORCID,Wang Xinwei⁵⁶⁷⁸⁹,Geng Dongsheng¹⁰¹¹¹²¹³⁹^ORCID,Ozgit-Akgun Cagla¹⁴¹⁵¹⁶¹⁷,Schneider Nathanaelle¹⁸¹⁹²⁰²¹²²,Elam Jeffrey W.²³²⁴²⁵⁴

Affiliation:

1. Department of Mechanical Engineering

2. University of Arkansas

3. Fayetteville

4. USA

5. School of Advanced Materials

6. Shenzhen Graduate School

7. Peking University

8. Shenzhen 518055

9. China

10. Center for Green Innovation

11. School of Mathematics and Physics

12. University of Science and Technology Beijing

13. Beijing 100083

14. ASELSAN Inc. – Microelectronics

15. Guidance and Electro-Optics Business Sector

16. Ankara 06750

17. Turkey

18. Institut de Recherche et Développement sur l'Energie Photovoltaïque (IRDEP, UMR 7174, EDF-CNRS-Chimie ParisTech)

19. 78401 Chatou

20. France

21. Institut Photovoltaïque d'Ile de France (IPVF)

22. 92160 Antony

23. Energy Systems Division

24. Argonne National Laboratory

25. Argonne

Abstract

This review article summarizes the recent progress of atomic layer deposition (ALD) in energy technologies including rechargeable secondary batteries, fuel cells, photovoltaics, and optoelectronics.

Funder

National Science Foundation

Basic Energy Sciences

Publisher

Royal Society of Chemistry (RSC)

Subject

Electrical and Electronic Engineering,Process Chemistry and Technology,Mechanics of Materials,General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2017/MH/C6MH00521G

Reference297 articles.

1. The chemistry of functional nanomaterials

2. Nanostructured materials for advanced energy conversion and storage devices