Normal and off-normal incidence dissociative dynamics of O2(v,J) on ultrathin Cu films grown on Ru(0001)-Reference-Cited by-同舟云学术

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Normal and off-normal incidence dissociative dynamics of O2(v,J) on ultrathin Cu films grown on Ru(0001)

Published:2021 Issue:13 Volume:23 Page:7768-7776
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Fallaque J. G.¹²³⁴⁵^ORCID,Ramos M.⁶⁷⁸⁹^ORCID,Busnengo H. F.⁶⁷⁸⁹^ORCID,Martín F.¹²³⁴⁵^ORCID,Díaz C.¹⁰¹¹¹²¹³⁵^ORCID

Affiliation:

1. Departamento de Química

2. Módulo 13

3. Universidad Autónoma de Madrid

4. 28049 Madrid

5. Spain

6. Instituto de Física Rosario

7. CONICET and Universidad Nacional de Rosario

8. 2000 Rosario

9. Argentina

10. Departamento de Química Física

11. Facultad de CC. Químicas

12. Universidad Complutense de Madrid

13. 28040 Madrid

Abstract

Ligand and strain effects, rather than the surface state population, are responsible for O₂ sticking on Cu_ML/Ru(0001) at thermal energies.

Funder

Fondo para la Investigación Científica y Tecnológica

Ministerio de Ciencia e Innovación

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2021/CP/D0CP03979A

Reference70 articles.

1. Theory of the oxidation of metals

2. Complex pathways in dissociative adsorption of oxygen on platinum

3. Oxidation of Iron: The Relation between Oxidation Kinetics and Oxide Electronic Structure

4. Selective Production of Reactive and Nonreactive Oxygen Atoms on Pd(001) by Rotationally Aligned Oxygen Molecules

5. Recent advances in heterogeneous selective oxidation catalysis for sustainable chemistry

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