Silicon direct bonding via low-temperature wet chemical surface activation
Author:
Affiliation:
1. State Key Laboratory of Advanced Welding and Joining
2. Harbin Institute of Technology
3. Harbin
4. China
5. Materials Research Laboratory
6. University of California
7. Santa Barbara
8. USA
Abstract
A p–n junction with excellent I–V characteristics was prepared through low-temperature chemical surface activation direct bonding without rigorous conditions.
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA05189H
Reference25 articles.
1. Wafer bonding for silicon‐on‐insulator technologies
2. Silicon‐to‐silicon direct bonding method
3. Nanoadhesion layer for enhanced Si–Si and Si–SiN wafer bonding
4. Characterization of bonding interface prepared by room-temperature Si wafer direct bonding using the surface smoothing effect of a Ne fast atom beam
5. Investigation of fluorine containing plasma activation for room-temperature bonding of Si-based materials
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