Rapid and maskless nanopatterning of aluminosilicate glass surface via friction-induced selective etching in HF solution-Reference-Cited by-同舟云学术

Rapid and maskless nanopatterning of aluminosilicate glass surface via friction-induced selective etching in HF solution

Published:2015 Issue:97 Volume:5 Page:79964-79968
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Song Chenfei¹²³⁴⁵,Yu Bingjun¹²³⁴⁵,Wang Mian¹²³⁴⁵,Qian Linmao¹²³⁴⁵

Affiliation:

1. Tribology Research Institute

2. National Traction Power Laboratory

3. Southwest Jiaotong University

4. Chengdu 610031

5. P. R. China

Abstract

A rapid and maskless nanofabrication method on glass was proposed, which consisted of scanning with a diamond tip and post-etching in HF solution. The masking effect on scan area is attributed to the formation of AlF₃during etching.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C5RA13049B

Reference24 articles.

1. Silanization of glass chips—A factorial approach for optimization

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