Ultra-rapid pattern formation of block copolymers with a high-χ parameter in immersion annealing induced by a homopolymer-Reference-Cited by-同舟云学术

Ultra-rapid pattern formation of block copolymers with a high-χ parameter in immersion annealing induced by a homopolymer

Published:2016 Issue:25 Volume:6 Page:21105-21110
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Kim Myung Jin¹²³⁴,Park Woon Ik⁵³⁴,Choi Young Joong⁶²³⁴,Jung Yun Kyung⁷⁸⁹,Kim Kwang Ho⁵³⁴⁶²

Affiliation:

1. School of Convergence Science

2. Pusan National University

3. Busan 609-735

4. Republic of Korea

5. Global Frontier R&D Center for Hybrid Interface Materials (HIM)

6. School of Materials Science and Engineering

7. School of Natural Science

8. Ulsan National Institute of Science and Technology (UNIST)

9. South Korea

Abstract

Ultra-rapid pattern formation of homopolymer/BCP blend is demonstrated. A highly ordered dot pattern can be achieved for an extremely short immersion time (10 s) by controlling the annealing temperature and mixing ratio of binary solvent.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA00350H

Reference35 articles.

1. Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric Fields

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4. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures

5. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates

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