Electrochemical mechanical micromachining based on confined etchant layer technique-Reference-Cited by-同舟云学术

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Electrochemical mechanical micromachining based on confined etchant layer technique

Published:2013 Issue: Volume:164 Page:189
ISSN:1359-6640
Container-title:Faraday Discussions
language:en
Short-container-title:Faraday Discuss.

Author:

Yuan Ye,Han Lianhuan,Zhang Jie,Jia Jingchun,Zhao Xuesen,Cao Yongzhi,Hu Zhenjiang,Yan Yongda,Dong Shen,Tian Zhong-Qun,Tian Zhao-Wu,Zhan Dongping

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2013/FD/C3FD00008G

Reference23 articles.

1. Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)

2. A path: from electroplating through lithographic masks in electronics to LIGA in MEMS

3. Mechanisms of fatigue in LIGA Ni MEMS thin films

4. Manufacturing Aspects of LIGA Technologies

5. Ultrathick and High-Aspect-Ratio Nickel Microgyroscope Using EFAB Multilayer Additive Electroforming

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Confined Etchant Layer Technique: An Electrochemical Approach to Micro-/Nanomachining;The Journal of Physical Chemistry C;2023-07-06

2. Micromachining of predesigned perpendicular copper micropillar array by scanning electrochemical microscopy;Electrochimica Acta;2023-02

3. Pulse Potential Confined Electrochemical Polishing on Gallium Arsenide Wafer;Journal of The Electrochemical Society;2021-04-01

4. Chemical Etching Processes at the Dynamic GaAs/Electrolyte Interface in the Electrochemical Direct-Writing Micromachining;ACS Applied Electronic Materials;2021-01-14

5. Electrochemical nanomachining;Current Opinion in Electrochemistry;2020-08

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