Femtosecond-laser-assisted high-aspect-ratio nanolithography in lithium niobate-Reference-Cited by-同舟云学术

Femtosecond-laser-assisted high-aspect-ratio nanolithography in lithium niobate

Published:2023 Issue:37 Volume:15 Page:15298-15303
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Wang Tianxin¹,Cheng Xiaoyan¹,Li Xuan¹,Ma Jianan¹,Yan Shuo¹,Hu Xueli¹,Qi Kai¹,Fan Weiwen¹,Liu Manman¹,Xu Xiaoyi¹,Lu Xiaomei¹^ORCID,Jiang Xiaoshun¹,Zhang Yong¹²^ORCID

Affiliation:

1. National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, School of Physics, Nanjing University, Nanjing 210093, China

2. Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China

Abstract

A femtosecond-laser-assisted lithium niobate nanolithography technique is developed. The etching rate is enhanced to 2 μm h−1. The nanohole size reaches ∼100 nm and the aspect ratio is above 40 : 1.

Funder

Nanjing University

National Key Research and Development Program of China

China Postdoctoral Science Foundation

National Natural Science Foundation of China

Fundamental Research Funds for the Central Universities

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2023/NR/D3NR03750A