Capping layer enabled controlled fragmentation of two-dimensional materials by cold drawing-Reference-Cited by-同舟云学术

Capping layer enabled controlled fragmentation of two-dimensional materials by cold drawing

Published:2023 Issue:12 Volume:10 Page:5859-5868
ISSN:2051-6347
Container-title:Materials Horizons
language:en
Short-container-title:Mater. Horiz.

Author:

Chen Ming¹²^ORCID,Li Dong³,Hou Yuxin¹²,Gu Mengxi¹²,Zeng Qingsheng⁴,Ning De¹²,Li Weimin¹²^ORCID,Zheng Xue¹²^ORCID,Shao Yan¹²,Wang Zhixun⁵,Xia Juan⁶,Yang Chunlei¹²,Wei Lei⁵^ORCID,Gao Huajian³⁷

Affiliation:

1. Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China

2. University of Chinese Academy of Sciences, Beijing 100049, China

3. School of Mechanical and Aerospace Engineering, Nanyang Technological University, Singapore 639798, Singapore

4. Center for Programmable Materials, School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798, Singapore

5. School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Singapore

6. Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu, China

7. Institute of High Performance Computing, A*STAR, Singapore 138632, Singapore

Abstract

This study gives an accurate understanding of interactions between 2D materials, polymer substrates, and capping layers during cold drawing, and offers guidance for potential applications such as flexible electronics.

Funder

Basic and Applied Basic Research Foundation of Guangdong Province

Shenzhen Fundamental Research Program

Chinese Academy of Sciences

Ministry of Education - Singapore

Agency for Science, Technology and Research

Publisher

Royal Society of Chemistry (RSC)

Subject

Electrical and Electronic Engineering,Process Chemistry and Technology,Mechanics of Materials,General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2023/MH/D3MH00762F