Electrostatic crosslinking-enabled highly asymmetric lamellar nanostructures of polyzwitterionic block copolymers for lithography-Reference-Cited by-同舟云学术

Electrostatic crosslinking-enabled highly asymmetric lamellar nanostructures of polyzwitterionic block copolymers for lithography

Published:2023 Issue:9 Volume:15 Page:4553-4560
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Ding Shi-Peng¹,Zhang Ze-Kun¹,Ye Ze¹,Xia Ding-Li¹,Xu Jun-Ting¹^ORCID

Affiliation:

1. State Key Laboratory of Motor Vehicle Biofuel Technology, International Research Center for X Polymers, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, China

Abstract

Intermolecular coulombic interactions induce physical crosslinking and thus the formation of highly asymmetric lamellar nanostructures in a broad composition range for polyzwitterionic block copolymers.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2023/NR/D3NR00073G

Reference35 articles.

1. Nanomanufacturing: A Perspective

2. Lithography, metrology and nanomanufacturing

3. Block Copolymer Nanopatterning for Nonsemiconductor Device Applications

4. Silicon-containing block copolymers for lithographic applications

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