Single photon emission from plasma treated 2D hexagonal boron nitride

Author:

Xu Zai-Quan12345ORCID,Elbadawi Christopher12345,Tran Toan Trong12345ORCID,Kianinia Mehran12345,Li Xiuling678910,Liu Daobin678910,Hoffman Timothy B.1112131415,Nguyen Minh12345,Kim Sejeong12345,Edgar James H.1112131415,Wu Xiaojun678910ORCID,Song Li678910ORCID,Ali Sajid12345ORCID,Ford Mike12345ORCID,Toth Milos12345,Aharonovich Igor12345ORCID

Affiliation:

1. School of Mathematical and Physical Sciences

2. Faculty of Science

3. University of Technology Sydney

4. Ultimo

5. Australia

6. School of Chemistry and Materials Sciences

7. CAS Key Lab of Materials for Energy Conversion

8. and CAS Center for Excellence in Nanoscience

9. Hefei National Laboratory of Physics at the Microscale

10. Synergetic Innovation of Quantum Information & Quantum Technology

11. Department of Chemical Engineering

12. Durland Hall

13. Kansas State University

14. Manhattan

15. USA

Abstract

Ar plasma etching and annealing are highly robust in generating oxygen related single photon emitters in hBN.

Funder

National Stroke Foundation

Australian Research Council

Forschungskreis der Ernährungsindustrie

National Natural Science Foundation of China

Ministry of Science and Technology of the People's Republic of China

Chinese Academy of Sciences

University of Science and Technology of China

Office of Naval Research Global

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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