Quantum confinement induced ultra-high intensity interfacial radiative recombination in nanolaminates
Author:
Affiliation:
1. Key Laboratory of Aerospace Materials and Performance (Ministry of Education)
2. School of Materials Science and Engineering
3. Beihang University (BUAA)
4. Beijing
5. China
Abstract
Interfacial emissions of different bands are achieved in nanolaminate systems by introducing quantum confinement effect.
Funder
National Natural Science Foundation of China
Publisher
Royal Society of Chemistry (RSC)
Subject
General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2017/NR/C7NR06564G
Reference42 articles.
1. Giant dielectric constant in TiO2/Al2O3nanolaminates grown on doped silicon substrate by pulsed laser deposition
2. Mechanical properties of atomic layer deposited Al2O3/ZnO nanolaminates
3. Effects of the interfacial layer on electrical characteristics of Al2O3/TiO2/Al2O3 thin films for gate dielectrics
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