Dual-gate Ferroelectric Field-effect Transistors: An Emerging Computational Memory for Advanced Logic Operations

Author:

Luo Zheng-Dong12,Liu Yan23,Han Genquan123,Alexe Marin4

Affiliation:

1. aHangzhou Institute of Technology, Xidian University, Hangzhou 311200, China

2. bState Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi’an 710071, China

3. cResearch Center for Intelligent Chips, Zhejiang Lab, Hangzhou 311121, China

4. dDepartment of Physics, The University of Warwick, Coventry, CV4 7AL, UK

Abstract

The emerging data-centric computation and the scalability limits of modern CMOS technology together have imposed strict challenges on modern information-processing paradigms. New types of logic devices with corresponding computing architecture that can process information in fundamentally different ways are being developed to offer extreme energy and time efficiency. In this chapter, we provide a timely account of recent progress in the field of digital Boolean logic in-memory computing, highlighting dual-gate ferroelectric field-effect transistors – a promising computational memory device concept for advanced logic operations.

Publisher

Royal Society of Chemistry

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