Atomic layer deposition of PbCl2, PbBr2 and mixed lead halide (Cl, Br, I) PbXnY2−n thin films

Author:

Popov Georgi1ORCID,Bačić Goran2ORCID,Van Dijck Charlotte1,Junkers Laura S.1ORCID,Weiß Alexander1ORCID,Mattinen Miika1ORCID,Vihervaara Anton1ORCID,Chundak Mykhailo1ORCID,Jalkanen Pasi3ORCID,Mizohata Kenichiro3ORCID,Leskelä Markku1ORCID,Masuda Jason D.4ORCID,Barry Seán T.2ORCID,Ritala Mikko1ORCID,Kemell Marianna1ORCID

Affiliation:

1. Department of Chemistry, University of Helsinki, P. O. Box 55, FI-00014 Helsinki, Finland

2. Department of Chemistry, Carleton University, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada

3. Department of Physics, University of Helsinki, P. O. Box 43, FI-00014 Helsinki, Finland

4. Department of Chemistry, Saint Mary's University, 923 Robie Street, Halifax, Nova Scotia B3H 3C3, Canada

Abstract

We describe six new atomic layer deposition processes for PbCl2 and PbBr2. Two processes deliver high quality uniform and conformal PbCl2 and PbBr2 thin films fit for semiconductor devices.

Funder

Helsingin Yliopisto

Emil Aaltosen Säätiö

Walter Ahlströmin Säätiö

Academy of Finland

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

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