Cl-Loss dynamics in the dissociative photoionization of CF3Cl with threshold photoelectron–photoion coincidence imaging-Reference-Cited by-同舟云学术

Cl-Loss dynamics in the dissociative photoionization of CF3Cl with threshold photoelectron–photoion coincidence imaging

Author:

Wu Xiangkun¹²³⁴⁵,Tang Guoqiang¹²³⁴⁵,Zhang Hanhui¹²³⁴⁵,Zhou Xiaoguo¹²³⁴⁵^ORCID,Liu Shilin¹²³⁴⁵^ORCID,Liu Fuyi⁶⁴⁵⁷,Sheng Liusi⁶⁴⁵⁷,Yan Bing⁸⁹¹⁰⁷

Affiliation:

1. Hefei National Laboratory for Physical Sciences at the Microscale

2. iChEM (Collaborative Innovation Center of Chemistry for Energy Materials)

3. Department of Chemical Physics

4. University of Science and Technology of China

5. Hefei

6. National Synchrotron Radiation Laboratory

7. China

8. Institute of Atomic and Molecular Physics

9. Jilin University

10. Changchun 130012

Abstract

Cl-loss dynamics in the dissociative photoionization of CF₃Cl was investigated in the photon energy range of 12.30–18.50 eV.

Funder

National Natural Science Foundation of China

Ministry of Science and Technology of the People's Republic of China

University of Science and Technology of China

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

Reference76 articles.

1. J. W. Coburn , Plasma etching and reactive ion etching , American Institute of Physics , New York , 1982

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