Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selector
Author:
Affiliation:
1. IMEC
2. Belgium
3. ASM-Belgium
4. Air Liquide
5. France
6. TU Ghent
7. KU Leuven
Abstract
Pulsed CVD can be utilized to deposit GeSe in a highly conformal fashion.
Publisher
Royal Society of Chemistry (RSC)
Subject
Microbiology
Link
http://pubs.rsc.org/en/content/articlepdf/2021/MA/D0MA01014F
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1. Crossbar RRAM Arrays: Selector Device Requirements During Read Operation
2. Memory grows up
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5. Threshold switching characteristics
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1. Amorphous Ge-Se-S chalcogenide alloys via post plasma sulfurization of atomic layer deposition GeSe for ovonic threshold switch applications;Journal of Alloys and Compounds;2023-06
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