Incorporation-limiting mechanisms during nitrogenation of monolayer graphene films in nitrogen flowing afterglows-Reference-Cited by-同舟云学术

Incorporation-limiting mechanisms during nitrogenation of monolayer graphene films in nitrogen flowing afterglows

Published:2021 Issue:5 Volume:13 Page:2891-2901
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Robert Bigras G.¹²³⁴,Martel R.⁵²³⁴^ORCID,Stafford L.¹²³⁴^ORCID

Affiliation:

1. Département de Physique

2. Université de Montréal

3. Montréal

4. Canada

5. Département de Chimie

Abstract

Modification of graphene films in the flowing afterglow of microwave N₂ plasmas. Nitrogenation is first limited by the formation of defect sites by plasma-generated N and N₂(A) at low damage and then by the adsorption of nitrogen atoms at high damage.

Funder

Natural Sciences and Engineering Research Council of Canada

Public Risk Management Association

Fonds de recherche du Québec – Nature et technologies

Canada Research Chairs

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2021/NR/D0NR07827A

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